2017中国国际半导体技术大会（CSTIC）已过期

会议通知

No.2727 Riverside Avenue Pudong, Shanghai 200120, China

SEMICON China

会议日程
（最终日程以会议现场为准）

08:45–09:30	Opening Ceremony
	Opening Remarks by Conference Chair
	Opening Remarks by SEMI
	Opening Remarks by IMEC
	Opening Remarks by Chinese Government Representatives
	Presentation of SEMI Best Student Paper Awards and SEMI Best Young Engineer
	Paper Awards

Meeting Room	3rd Floor Auditorium

09:30 –10:10	Prof.Hiroshi Amano
	Nobel Laureate in Physics, 2014
	Director, Center for Integrated Research of Future Electronics, Institute of Materials and Systems for Sustainability, Nagoya University

10:10–10:25	Coffee Break

10:25–11:05	Dr.Tzu-Yin Chiu
	CEO and Executive Director,Semiconductor Manufacturing International Corp.(SMIC)

11:05–11:35	Dr.Jong Shik Yoon
	Executive Vice President Foundry Business System-LSI,Samsung Electronics Co,LTD,Korea.

11:35–12:05	Prof.Rao Tummala
	Joseph.M Pettit Chair Professor in ECE and MSE Director, 3D MicrosystemsPackaging Research Center Georgia Research Alliance Eminent ScholarGeorgia Institute of Technology, Atlanta, Ga, USA

12:05–13:30	7th Floor Grand Ballroom 1

Panel DiscussionSunday, March 12, 2017Meeting Room: 3B17:00-18:00Moderator:Panel Members:

Sunday, March 12, 2017
13:30 – 18:00	Parallel Symposium Oral Sessions

Coffee Break	Conference Poster Session

Monday,March 13,2017
8:00-18:00	Parallel Symposium Oral Sessions

Joint SessionsSymposium II and Symposium III-Lithograpy/Etch joint sessionSunday, March 12, 2017Shanghai International Convention CenteMeeting Room: 3rd Floor Yellow River Hall黄河厅Session Chairs: Kafai Lai () and Ying Zhang (Applied Material)

13:30-13:35	Opening Remarks
	Kafai Lai / Ying Zhang
**13:35-14:05	TBD
	Donis Flagello, Nikon Research America
**14:05-14:35	Patterning Technology Inflections for the 10n and Beyond Logic Nodes
	Rich Wise, Lam Research
*14:35-14:55	Development of 250W EUV light source for HConsiderations for pattern fidelity control towards 5nm nodeVM lithography
	Hidetami Yaegashi, TEL
*14:55-15:15	The Insertion of extreme ultraviolet lithography (EUVL) from patterning perspective
	Weimin Gao, Synopsys
15:15-15:30	Coffee Break

Symposium II and Symposium IX-DTCO Joint sessionMonday, March 13, 2017Meeting Room: 3rd Floor Yellow River Hall黄河厅Session chairs: Leo Pang / Yiyu Shi

*8:30-8:35	Opening Remarks
	Leo Pang / Yiyu Shi
**8:35-9:05	Design Technology Co-optimization for Disruptive Patterning Schemes
	Puneet Gupta, UCLA
**9:05-9:35	TBD
	Shaojun Wei, Tsinghua University
*9:35-9:55	TBD
	Luigi Capodieci, Motovi.ai
9:55-10:10	Coffee Break